On June 15, 2020, Shuoke Zhongkexin announced that the 12-inch medium beam ion implanter was successfully moved into the integrated circuit mass production line, which marks the marketization of the domestic ion implanter to a new level!
The development of CMOS process has greatly promoted the development of ion implantation process. It can also be said that the continuous maturity of ion implantation process has further improved the quality of integrated circuit products, especially the performance of CMOS products. , ion implantation has become an indispensable process in the entire integrated circuit manufacturing process.
In the process of chip production, multiple ion implantation needs to be performed, and the implantation times are different for different chip types and process nodes in different positions of the chip. With the rapid advancement of CMOS technology, the number of ion implantations also increases rapidly. For example, in the 1970s an n-type metal-oxide-semiconductor (NMOS) might have taken as little as 6-8 implants, and now 40 or more implants are required for 28nm logic devices.
In the actual manufacturing process, the requirements for ion implantation are also different, such as junction depth (energy given to ions during implantation), dose (the amount of impurities required during implantation), uniformity, repeatability, etc. All have different requirements. Generally speaking, the dose of ion implantation depends on the beam current value and time, and the implantation depth depends on the accelerating electric field. In order to meet these different needs, ion implanters with different processing capabilities are required in different links, including Medium Current ion implanters, High Current ion implanters, and High Energy ion implanters. injection machine.
The ion implanter industry for integrated circuits has high competition barriers and high industry concentration. Overall, the entire market is mainly monopolized by American manufacturers. Applied Materials, Axcelis, and Advanced Ion Beam Technology (AIBT) together account for 80% of the global market.
Driven by various policies, the research and development of ion implanters in my country has also made significant progress. A few days ago, the Beijing Municipal Science and Technology Award Office announced the project evaluation results of the 2019 Beijing Municipal Science and Technology Award committees. The ion implanter suppliers Shuoke Zhongkexin and Keystone participated hand in hand.
Shuoke Zhongkexin focuses on the research and development and manufacture of ion implanters for integrated circuits, and has always been committed to solving the problem of independent controllability of key technologies of ion implanters. It has formed medium beam, large beam, high energy, special applications and third-generation semiconductors. It has a post-doctoral research station and an ion implanter industrialization platform that meets the requirements of SEMI standards, with an annual production capacity of 30 units. The products are widely used in world-renowned chip manufacturing companies and are highly recognized by customers.
The 12-inch medium-beam ion implanter delivered this time has excellent functions in angle control, dose control and equipment process capability, and the performance of the whole machine has reached the international level of similar products.
The person in charge of Shuoke Zhongkexin said that tying the mainstream is just the beginning, and the goal is to achieve domestic substitution in a system. The company’s self-developed ion implanter series products have accumulated a total of 6.5 million wafers on the customer’s production line, which has stably supported the customer’s mass production. In addition, a professional after-sales service team has been established to implement a 7X24 On Call response mechanism to continuously improve customer experience and accelerate the localization process.
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